Origin of ultrafast growth of monolayer WSe2 via chemical vapor deposition

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
2057-3960
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Origin of ultrafast growth of monolayer WSe2 via chemical vapor deposition ; volume:5 ; number:1 ; day:27 ; month:2 ; year:2019 ; pages:1-8 ; date:12.2019
npj computational materials ; 5, Heft 1 (27.2.2019), 1-8, 12.2019

Creator
Chen, Shuai
Gao, Junfeng
Srinivasan, Bharathi M.
Zhang, Gang
Sorkin, Viacheslav
Hariharaputran, Ramanarayan
Zhang, Yong-Wei
Contributor
SpringerLink (Online service)

DOI
10.1038/s41524-019-0167-2
URN
urn:nbn:de:101:1-2019031722073163171582
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 11:00 AM CEST

Data provider

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Associated

  • Chen, Shuai
  • Gao, Junfeng
  • Srinivasan, Bharathi M.
  • Zhang, Gang
  • Sorkin, Viacheslav
  • Hariharaputran, Ramanarayan
  • Zhang, Yong-Wei
  • SpringerLink (Online service)

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