A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVD
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVD ; volume:13 ; number:1 ; day:10 ; month:8 ; year:2018 ; pages:1-9 ; date:12.2018
Nanoscale research letters ; 13, Heft 1 (10.8.2018), 1-9, 12.2018
- Creator
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Wang, Yuwei
- Contributor
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Liu, Hong
Shen, Wenzhong
SpringerLink (Online service)
- DOI
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10.1186/s11671-018-2641-z
- URN
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urn:nbn:de:101:1-2018101000033974076389
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:28 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Wang, Yuwei
- Liu, Hong
- Shen, Wenzhong
- SpringerLink (Online service)