A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVD
- Location
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                Deutsche Nationalbibliothek Frankfurt am Main
 
- ISSN
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                1556-276X
 
- Extent
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                Online-Ressource
 
- Language
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                Englisch
 
- Notes
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                online resource.
 
- Bibliographic citation
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                A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVD ; volume:13 ; number:1 ; day:10 ; month:8 ; year:2018 ; pages:1-9 ; date:12.2018
Nanoscale research letters ; 13, Heft 1 (10.8.2018), 1-9, 12.2018
 
- Creator
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                Wang, Yuwei
 
- Contributor
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                Liu, Hong
Shen, Wenzhong
SpringerLink (Online service)
 
- DOI
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                        10.1186/s11671-018-2641-z
 
- URN
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                        urn:nbn:de:101:1-2018101000033974076389
 
- Rights
 - 
                
                    
                        Der Zugriff auf das Objekt ist unbeschränkt möglich.
 
- Last update
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                        15.08.2025, 7:28 AM CEST
 
Data provider
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Associated
- Wang, Yuwei
 - Liu, Hong
 - Shen, Wenzhong
 - SpringerLink (Online service)