Characterization of damage morphology of structural SiO 2 film induced by nanosecond pulsed laser

Abstract: We investigated the damage morphology of porous silicon oxide film with a periodic hexagonal hole array irradiated by nanosecond pulsed laser, both experimentally and numerically. To understand the damage morphology, the temperature field distribution and the thermal stress distribution during the laser radiation process were investigated by finite element method. The simulation results show that the thermal stress regulated by periodic structural surface is the reason for the circumferential and discrete distribution of the damage points. The results provide ideas for improving the laser damage resistance of the structural surfaces.

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Characterization of damage morphology of structural SiO 2 film induced by nanosecond pulsed laser ; volume:20 ; number:1 ; year:2022 ; pages:724-729 ; extent:6
Open physics ; 20, Heft 1 (2022), 724-729 (gesamt 6)

Creator
Li, Yuan
Su, Junhong
Xu, Junqi
Yang, Guoliang

DOI
10.1515/phys-2022-0060
URN
urn:nbn:de:101:1-2022072818503575624520
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:25 AM CEST

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Associated

  • Li, Yuan
  • Su, Junhong
  • Xu, Junqi
  • Yang, Guoliang

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