Characterization of damage morphology of structural SiO 2 film induced by nanosecond pulsed laser

Abstract: We investigated the damage morphology of porous silicon oxide film with a periodic hexagonal hole array irradiated by nanosecond pulsed laser, both experimentally and numerically. To understand the damage morphology, the temperature field distribution and the thermal stress distribution during the laser radiation process were investigated by finite element method. The simulation results show that the thermal stress regulated by periodic structural surface is the reason for the circumferential and discrete distribution of the damage points. The results provide ideas for improving the laser damage resistance of the structural surfaces.

Standort
Deutsche Nationalbibliothek Frankfurt am Main
Umfang
Online-Ressource
Sprache
Englisch

Erschienen in
Characterization of damage morphology of structural SiO 2 film induced by nanosecond pulsed laser ; volume:20 ; number:1 ; year:2022 ; pages:724-729 ; extent:6
Open physics ; 20, Heft 1 (2022), 724-729 (gesamt 6)

Urheber
Li, Yuan
Su, Junhong
Xu, Junqi
Yang, Guoliang

DOI
10.1515/phys-2022-0060
URN
urn:nbn:de:101:1-2022072818503575624520
Rechteinformation
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Letzte Aktualisierung
15.08.2025, 07:25 MESZ

Datenpartner

Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.

Beteiligte

  • Li, Yuan
  • Su, Junhong
  • Xu, Junqi
  • Yang, Guoliang

Ähnliche Objekte (12)