Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2045-2322
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces ; volume:8 ; number:1 ; day:1 ; month:2 ; year:2018 ; pages:1-7 ; date:12.2018
Scientific reports ; 8, Heft 1 (1.2.2018), 1-7, 12.2018
- Classification
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Naturwissenschaften
- Creator
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Gurbán, S.
- Contributor
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Petrik, P.
Serényi, M.
Sulyok, A.
Menyhárd, M.
Baradács, E.
Parditka, B.
Cserháti, C.
Langer, G. A.
Erdélyi, Z.
SpringerLink (Online service)
- DOI
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10.1038/s41598-018-20537-4
- URN
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urn:nbn:de:1111-2018041618446
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 10:44 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Gurbán, S.
- Petrik, P.
- Serényi, M.
- Sulyok, A.
- Menyhárd, M.
- Baradács, E.
- Parditka, B.
- Cserháti, C.
- Langer, G. A.
- Erdélyi, Z.
- SpringerLink (Online service)