Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
2045-2322
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces ; volume:8 ; number:1 ; day:1 ; month:2 ; year:2018 ; pages:1-7 ; date:12.2018
Scientific reports ; 8, Heft 1 (1.2.2018), 1-7, 12.2018

Classification
Naturwissenschaften

Creator
Gurbán, S.
Contributor
Petrik, P.
Serényi, M.
Sulyok, A.
Menyhárd, M.
Baradács, E.
Parditka, B.
Cserháti, C.
Langer, G. A.
Erdélyi, Z.
SpringerLink (Online service)

DOI
10.1038/s41598-018-20537-4
URN
urn:nbn:de:1111-2018041618446
Rights
Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:44 AM CEST

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Associated

  • Gurbán, S.
  • Petrik, P.
  • Serényi, M.
  • Sulyok, A.
  • Menyhárd, M.
  • Baradács, E.
  • Parditka, B.
  • Cserháti, C.
  • Langer, G. A.
  • Erdélyi, Z.
  • SpringerLink (Online service)

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