Thermal oxidation process on Si(113)-(3 × 2) investigated using high-temperature scanning tunneling microscopy
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Thermal oxidation process on Si(113)-(3 × 2) investigated using high-temperature scanning tunneling microscopy ; volume:13 ; pages:172-181
Beilstein journal of nanotechnology ; 13, 172-181
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.13.12
- URN
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urn:nbn:de:101:1-2022042811511099074563
- Rechteinformation
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:38 MESZ
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