Approaching metal oxide high-k dielectrics and semiconductors by solution-processing of molecular precursors
- Weitere Titel
-
Anorganische Dielektrika und Halbleiter auf Metalloxidbasis durch lösungsbasierte Prozessierung aus molekularen Vorläufern
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
Darmstadt, Technische Universität Darmstadt, Dissertation, 2021
- Schlagwort
-
Dielectrics
Semiconductors
- Ereignis
-
Veröffentlichung
- (wo)
-
Darmstadt
- (wer)
-
Universitäts- und Landesbibliothek
- (wann)
-
2021
- Urheber
- Beteiligte Personen und Organisationen
- DOI
-
10.26083/tuprints-00019379
- URN
-
urn:nbn:de:tuda-tuprints-193799
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
2025-08-15T07:27:26+0200
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Koslowski, Nico
- Schneider, Jörg J.
- Albert, Barbara
- Universitäts- und Landesbibliothek
Entstanden
- 2021
Ähnliche Objekte (12)
High-k gate dielectrics for CMOS technology
Van der Waals enabled formation and integration of ultrathin high-κ dielectrics on 2D semiconductors
Modeling of leakage currents in high-к dielectrics
Praseodymium silicate high-k dielectrics on Si(001)
High-k dielectrics for gallium nitride based electronic devices
Thickness mapping of high-κ dielectrics at the nanoscale
High-k dielectrics as bioelectronic interface for field effect transistors
Crystal growth technology : semiconductors and dielectrics
Size- and position-controlled Ge nanocrystals separated by high-k dielectrics
Chemically induced Fermi level pinning effects of high-k dielectrics on graphene
Modeling of Leakage Currents in High-k Dielectrics for Future DRAM Application
Femtosecond and attosecond electron dynamics in semiconductors and dielectrics
High-k gate dielectrics for CMOS technology
Van der Waals enabled formation and integration of ultrathin high-κ dielectrics on 2D semiconductors
Modeling of leakage currents in high-к dielectrics
Praseodymium silicate high-k dielectrics on Si(001)
High-k dielectrics for gallium nitride based electronic devices
Thickness mapping of high-κ dielectrics at the nanoscale
High-k dielectrics as bioelectronic interface for field effect transistors
Crystal growth technology : semiconductors and dielectrics
Size- and position-controlled Ge nanocrystals separated by high-k dielectrics
Chemically induced Fermi level pinning effects of high-k dielectrics on graphene
Modeling of Leakage Currents in High-k Dielectrics for Future DRAM Application
Femtosecond and attosecond electron dynamics in semiconductors and dielectrics
High-k gate dielectrics for CMOS technology
Van der Waals enabled formation and integration of ultrathin high-κ dielectrics on 2D semiconductors
Modeling of leakage currents in high-к dielectrics
Praseodymium silicate high-k dielectrics on Si(001)
High-k dielectrics for gallium nitride based electronic devices
Thickness mapping of high-κ dielectrics at the nanoscale
High-k dielectrics as bioelectronic interface for field effect transistors
Crystal growth technology : semiconductors and dielectrics
Size- and position-controlled Ge nanocrystals separated by high-k dielectrics
Chemically induced Fermi level pinning effects of high-k dielectrics on graphene
Modeling of Leakage Currents in High-k Dielectrics for Future DRAM Application