Atomic characterization of Si nanoclusters embedded in SiO2 by atom probe tomography
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Atomic characterization of Si nanoclusters embedded in SiO2 by atom probe tomography ; volume:6 ; number:1 ; day:23 ; month:2 ; year:2011 ; pages:1-8 ; date:12.2011
Nanoscale research letters ; 6, Heft 1 (23.2.2011), 1-8, 12.2011
- Creator
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Roussel, Manuel
Talbot, Etienne
Gourbilleau, Fabrice
Pareige, Philippe
- Contributor
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SpringerLink (Online service)
- DOI
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10.1186/1556-276X-6-164
- URN
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urn:nbn:de:101:1-2019090119371804534430
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:21 AM CEST
Data provider
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Associated
- Roussel, Manuel
- Talbot, Etienne
- Gourbilleau, Fabrice
- Pareige, Philippe
- SpringerLink (Online service)
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Elektronenzustände atomarer Eigendefekte des nichtkristallinen SiO2 [SiO]
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Otto Krisement Umwandlung SiO2 Christobalit
Electrical behavior of MIS devices based on Si nanoclusters embedded in SiO x N y and SiO2 films
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Magnetism from Fe2O3 nanoparticles embedded in amorphous SiO2 matrix
Fig. 3. SiO2
Effect of Different SiO2 Polymorphs on the Reaction Between SiO2 and SiC in Si Production
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Thermodynamic Properties of Supported and Embedded Metallic Nanocrystals: Gold on/in SiO2
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