TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes ; volume:15 ; year:2024 ; pages:1-12
Beilstein journal of nanotechnology ; 15 (2024), 1-12
- Urheber
- DOI
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10.3762/bjnano.15.1
- URN
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urn:nbn:de:101:1-2409261220185.050530842536
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:21 MESZ
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Beteiligte
- Williams, Joshua
- Faley, Michael I.
- Vas, Joseph Vimal
- Lu, Peng-Han
- Dunin-Borkowski, Rafal E.
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