Humidity‐Controlled Ultralow Power Layer‐by‐Layer Thinning, Nanopatterning and Bandgap Engineering of MoTe 2
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Humidity‐Controlled Ultralow Power Layer‐by‐Layer Thinning, Nanopatterning and Bandgap Engineering of MoTe 2 ; volume:28 ; number:52 ; year:2018 ; extent:9
Advanced functional materials ; 28, Heft 52 (2018) (gesamt 9)
- Urheber
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Nagareddy, V. Karthik
Octon, Toby J.
Townsend, Nicola J.
Russo, Saverio
Craciun, Monica F.
Wright, C. David
- DOI
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10.1002/adfm.201804434
- URN
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urn:nbn:de:101:1-2022081606482304150526
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:24 MESZ
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Beteiligte
- Nagareddy, V. Karthik
- Octon, Toby J.
- Townsend, Nicola J.
- Russo, Saverio
- Craciun, Monica F.
- Wright, C. David
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