- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783540416821
354041682X
- Dimensions
-
24 cm
- Extent
-
XIII, 260 S.
- Language
-
Englisch
- Notes
-
Ill., graph. Darst.
Literaturangaben
- Bibliographic citation
-
Springer series in materials science ; 46
- Keyword
-
Silicium
Kristallfläche
Oxidation
Silicium
Kristallfläche
Siliciumdioxid
Dünne Schicht
Schichtwachstum
- Event
-
Veröffentlichung
- (where)
-
Berlin, Heidelberg, New York, Barcelona, Hong Kong, London, Milan, Paris, Singapore, Tokyo
- (who)
-
Springer
- (when)
-
2001
- Contributor
-
Chabal, Yves J.
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.03.2025, 12:28 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Chabal, Yves J.
- Springer
Time of origin
- 2001
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