Measurements of the ns-laserpulse induced expansion of (111) silicon below and above the melting threshold on the nanosecond time scale
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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In: Applied Physics A ; 105 (2011), 1. - S. 25-30. - ISSN 0947-8396
- Classification
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Physik
- Event
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Veröffentlichung
- (where)
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Konstanz
- (who)
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Bibliothek der Universität Konstanz
- (when)
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2011
- Creator
- URN
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urn:nbn:de:bsz:352-165733
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:42 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Kneier, Fabian
- Geldhauser, Tobias
- Leiderer, Paul
- Boneberg, Johannes
- Bibliothek der Universität Konstanz
Time of origin
- 2011
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On the interpretation of time-resolved surface reflectivity measurements during the laser annealing of Si thin films
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Universal threshold for the steam laser cleaning of submicron spherical particles from silicon
Optical near-field imaging and nanostructuring by means of laser ablation
Direct laser interference patterning
Dynamics of the solidification of laser-annealed Si thin films
Behavior of thin metallic films upon melting with a ns-laser pulse
The influence of tip-sample interaction on step fluctuations on Ag (111)
Nanostructuring on WSe2 with the atomic force microscope by a potential controlled electrochemical reaction
Tuning the transmission of surface plasmon polaritons across nano and micro gaps in gold stripes
Optical reflectivity of si above the melting point
Nanosecond time-resolved reflectivity determination of the melting of metals upon pulsed laser annealing
On the interpretation of time-resolved surface reflectivity measurements during the laser annealing of Si thin films
Dynamik der Verfestigung von Halbleiterschichten nach ns-laser-annealing
Universal threshold for the steam laser cleaning of submicron spherical particles from silicon
Optical near-field imaging and nanostructuring by means of laser ablation
Direct laser interference patterning
Dynamics of the solidification of laser-annealed Si thin films
Behavior of thin metallic films upon melting with a ns-laser pulse
The influence of tip-sample interaction on step fluctuations on Ag (111)
Nanostructuring on WSe2 with the atomic force microscope by a potential controlled electrochemical reaction