Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties ; day:24 ; month:09 ; year:2021 ; extent:13
Advanced materials interfaces ; (24.09.2021) (gesamt 13)

Creator
Zywitzki, Dennis
Schaper, Raoul
Ciftyürek, Engin
Wree, Jan-Lucas
Taffa, Dereje H.
Baier, Daniel M.
Rogalla, Detlef
Li, Yujiao
Meischein, Michael
Ludwig, Alfred
Li, Zheshen
Schierbaum, Klaus
Wark, Michael
Devi, Anjana

DOI
10.1002/admi.202100949
URN
urn:nbn:de:101:1-2021092515105168808999
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:25 AM CEST

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