Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties ; day:24 ; month:09 ; year:2021 ; extent:13
Advanced materials interfaces ; (24.09.2021) (gesamt 13)
- Creator
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Zywitzki, Dennis
Schaper, Raoul
Ciftyürek, Engin
Wree, Jan-Lucas
Taffa, Dereje H.
Baier, Daniel M.
Rogalla, Detlef
Li, Yujiao
Meischein, Michael
Ludwig, Alfred
Li, Zheshen
Schierbaum, Klaus
Wark, Michael
Devi, Anjana
- DOI
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10.1002/admi.202100949
- URN
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urn:nbn:de:101:1-2021092515105168808999
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:25 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Zywitzki, Dennis
- Schaper, Raoul
- Ciftyürek, Engin
- Wree, Jan-Lucas
- Taffa, Dereje H.
- Baier, Daniel M.
- Rogalla, Detlef
- Li, Yujiao
- Meischein, Michael
- Ludwig, Alfred
- Li, Zheshen
- Schierbaum, Klaus
- Wark, Michael
- Devi, Anjana