Design of fabrication-tolerant meta-atoms for polarization-multiplexed metasurfaces
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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1 Online-Ressource.
- Language
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Englisch
- Bibliographic citation
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Design of fabrication-tolerant meta-atoms for polarization-multiplexed metasurfaces ; volume:14 ; number:5 ; day:18 ; month:9 ; year:2024 ; pages:990-999 ; date:10.2024
MRS communications / Materials Research Society ; 14, Heft 5 (18.9.2024), 990-999, 10.2024
- Classification
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Elektrotechnik, Elektronik
- Creator
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Klopfer, Elissa
Idehenre, Ighodalo
Sessions, Deanna
Carter, Michael J.
Buskohl, Philip R.
Harper, Eric S.
- Contributor
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SpringerLink (Online service)
- DOI
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10.1557/s43579-024-00629-1
- URN
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urn:nbn:de:101:1-2501092121485.695957145557
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:34 AM CEST
Data provider
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Associated
- Klopfer, Elissa
- Idehenre, Ighodalo
- Sessions, Deanna
- Carter, Michael J.
- Buskohl, Philip R.
- Harper, Eric S.
- SpringerLink (Online service)
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High‐Efficiency Phase and Polarization Modulation Metasurfaces
Light‐Controlled Fabrication of Disordered Hyperuniform Metasurfaces
Polarization multiplexed interrogation technique for FBG sensor array
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Arbitrary Polarization Readout with Dual‐Channel Neuro‐Metasurfaces
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On-chip multifunctional metasurfaces with full-parametric multiplexed Jones matrix
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