Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1556-276X
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Comparative analysis of barium titanate thin films dry etching using inductively coupled plasmas by different fluorine-based mixture gas ; volume:9 ; number:1 ; day:26 ; month:9 ; year:2014 ; pages:1-8 ; date:12.2014
Nanoscale research letters ; 9, Heft 1 (26.9.2014), 1-8, 12.2014

Creator
Li, Yang
Wang, Cong
Yao, Zhao
Kim, Hong-Ki
Kim, Nam-Young
Contributor
SpringerLink (Online service)

DOI
10.1186/1556-276X-9-530
URN
urn:nbn:de:101:1-2021082807411170700129
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 11:00 AM CEST

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Associated

  • Li, Yang
  • Wang, Cong
  • Yao, Zhao
  • Kim, Hong-Ki
  • Kim, Nam-Young
  • SpringerLink (Online service)

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