Area Selective Atomic Layer Deposition for the Use on Active Implants: An Overview of Available Process Technology

Abstract: Area‐selective atomic layer deposition (ASD) is a bottom‐up process that is of particular importance in the semiconductor industry, as it prevents edge defects and avoids cost‐intensive lithography steps. This approach not only offers immense potential for the manufacture of active implants but can also be used to improve them. This review paper presents various processes that can be used for this purpose. It also identifies aspects that shall be considered when implementing such a process for medical applications. For example, the inherent selectivity can be used to produce new biosensors, the passivated ASD can be used to encapsulate polymer‐based implants, and the activated ASD can be used to improve electrode performance. Finally, the aspects that shall be considered in a coating for active implants are highlighted. ASD therefore offers great potential for use on active implants.

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Area Selective Atomic Layer Deposition for the Use on Active Implants: An Overview of Available Process Technology ; day:26 ; month:12 ; year:2024 ; extent:13
Advanced healthcare materials ; (26.12.2024) (gesamt 13)

Creator

DOI
10.1002/adhm.202403149
URN
urn:nbn:de:101:1-2412271305375.315338247357
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:30 AM CEST

Data provider

This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.

Associated

Other Objects (12)