3D Two‐Photon Microprinting of Nanoporous Architectures

Abstract: A photoresist system for 3D two‐photon microprinting is presented, which enables the printing of inherently nanoporous structures with mean pore sizes around 50 nm by means of self‐organization on the nanoscale. A phase separation between polymerizable and chemically inert photoresist components leads to the formation of 3D co‐continuous structures. Subsequent washing‐out of the unpolymerized phase reveals the porous polymer structures. To characterize the volume properties of the printed structures, scanning electron microscopy images are recorded from ultramicrotome sections. In addition, the light‐scattering properties of the 3D‐printed material are analyzed. By adjusting the printing parameters, the porosity can be controlled during 3D printing. As an application example, a functioning miniaturized Ulbricht light‐collection sphere is 3D printed and tested.

Angaben zum Objekt

• Standort: Deutsche Nationalbibliothek Frankfurt am Main
• Umfang: Online-Ressource
• Sprache: Englisch

Verweise und Beziehungen

• Erschienen in: 3D Two‐Photon Microprinting of Nanoporous Architectures ; volume:32 ; number:32 ; year:2020 ; extent:7 ; Advanced materials ; 32, Heft 32 (2020) (gesamt 7)

Beteiligte, Orts- und Zeitangaben

• Urheber: Mayer, Frederik ; Ryklin, Daniel ; Wacker, Irene ; Curticean, Ernest Ronald ; Čalkovský, Martin ; Niemeyer, Andreas ; Dong, Zheqin ; Levkin, Pavel A. ; Gerthsen, Dagmar ; Schröder, Rasmus R. ; Wegener, Martin

Weitere Informationen

• DOI: 10.1002/adma.202002044
• URN: urn:nbn:de:101:1-2022061510271615304221
• Rechteinformation: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
• Letzte Aktualisierung: 15.08.2025, 07:30 MESZ