Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID) ; volume:9 ; pages:57-65
Beilstein journal of nanotechnology ; 9, 57-65
- Classification
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.9.8
- URN
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urn:nbn:de:101:1-2018091707380754676701
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
- 15.08.2025, 7:20 AM CEST
Data provider
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