Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID) ; volume:9 ; pages:57-65
Beilstein journal of nanotechnology ; 9, 57-65
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.9.8
- URN
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urn:nbn:de:101:1-2018091707380754676701
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
- 15.08.2025, 07:20 MESZ
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