Deposition behavior of TiB 2 by microwave heating chemical vapor deposition (CVD)
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Deposition behavior of TiB 2 by microwave heating chemical vapor deposition (CVD) ; volume:4 ; number:3 ; year:2015 ; pages:203-208 ; extent:6
Green processing & synthesis ; 4, Heft 3 (2015), 203-208 (gesamt 6)
- Creator
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Lu, Shuaidan
Sun, Shuchen
Huang, Xiaoxiao
Tu, Ganfeng
Zhu, Xiaoping
Li, Kuanhe
- DOI
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10.1515/gps-2015-0020
- URN
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urn:nbn:de:101:1-2501120326254.318612853375
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:30 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Lu, Shuaidan
- Sun, Shuchen
- Huang, Xiaoxiao
- Tu, Ganfeng
- Zhu, Xiaoping
- Li, Kuanhe
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