Development and metrology of extreme ultraviolet and soft x-ray multilayer mirrors
- Alternative title
-
Entwicklung und Charakterisierung von Multilayer-Spiegeln für den extrem ultravioletten Spektralbereich und weiche Röntgenstrahlung
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Notes
-
RWTH Aachen University and Padova University, Dissertation, 2016
- Classification
-
Physik
- Keyword
-
Metrology
Grazing incidence
Sun--Corona
Coatings
Optics
- Event
-
Veröffentlichung
- (where)
-
Aachen
- (who)
-
Universitätsbibliothek der RWTH Aachen
- (when)
-
2018
- Creator
- Contributor
- URN
-
urn:nbn:de:hbz:82-rwth-2016-056803
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
15.08.2025, 7:37 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Sertsu, Mewael Giday
- Nicolosi, Piergiorgio
- Juschkin, Larissa
- Universitätsbibliothek der RWTH Aachen
Time of origin
- 2018
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Nanofocusing of X-ray free-electron laser using wavefront-corrected multilayer focusing mirrors
Diffraction-based metrology in the extreme ultraviolet
Fabrication of Bragg Mirrors by Multilayer Inkjet Printing
Gold mirrors for X-ray astronomy
Development of ion beam sputtering for multilayer dispersive mirrors
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Multilayer Mirrors for Attosecond Pulse Shaping between 30 and 200 eV
Advanced X-ray multilayer waveguide optics
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Multimethod metrology of multilayer mirrors using EUV and X-Ray radiation
Radiation stability of EUV multilayer mirrors
Nanofocusing of X-ray free-electron laser using wavefront-corrected multilayer focusing mirrors
Diffraction-based metrology in the extreme ultraviolet
Fabrication of Bragg Mirrors by Multilayer Inkjet Printing
Gold mirrors for X-ray astronomy
Development of ion beam sputtering for multilayer dispersive mirrors
Multilayer mirrors for attosecond pulses in the water window spectral range
Multilayer mirrors for attosecond pulse shaping between 30 and 200 eV
Multilayer Mirrors for Attosecond Pulse Shaping between 30 and 200 eV
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