Development and metrology of extreme ultraviolet and soft x-ray multilayer mirrors
- Weitere Titel
-
Entwicklung und Charakterisierung von Multilayer-Spiegeln für den extrem ultravioletten Spektralbereich und weiche Röntgenstrahlung
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
RWTH Aachen University and Padova University, Dissertation, 2016
- Klassifikation
-
Physik
- Schlagwort
-
Metrology
Grazing incidence
Sun--Corona
Coatings
Optics
- Ereignis
-
Veröffentlichung
- (wo)
-
Aachen
- (wer)
-
Universitätsbibliothek der RWTH Aachen
- (wann)
-
2018
- Urheber
- Beteiligte Personen und Organisationen
- URN
-
urn:nbn:de:hbz:82-rwth-2016-056803
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:56 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Sertsu, Mewael Giday
- Nicolosi, Piergiorgio
- Juschkin, Larissa
- Universitätsbibliothek der RWTH Aachen
Entstanden
- 2018
Ähnliche Objekte (12)
Multimethod metrology of multilayer mirrors using EUV and X-Ray radiation
Radiation stability of EUV multilayer mirrors
Diffraction-based metrology in the extreme ultraviolet
Multilayer Mirrors for Attosecond Pulse Shaping between 30 and 200 eV
Multilayer mirrors for attosecond pulse shaping between 30 and 200 eV
Development of ion beam sputtering for multilayer dispersive mirrors
Multilayer mirrors for attosecond pulses in the water window spectral range
An extreme-ultraviolet frequency comb enabling frequency metrology with highly charged ions
XI. Numismatics and metrology
Children and Ultraviolet Radiation
Dreams and mirrors : = Träume und Spiegel
Industrial metrology : surfaces and roundness
Multimethod metrology of multilayer mirrors using EUV and X-Ray radiation
Radiation stability of EUV multilayer mirrors
Diffraction-based metrology in the extreme ultraviolet
Multilayer Mirrors for Attosecond Pulse Shaping between 30 and 200 eV
Multilayer mirrors for attosecond pulse shaping between 30 and 200 eV
Development of ion beam sputtering for multilayer dispersive mirrors
Multilayer mirrors for attosecond pulses in the water window spectral range
An extreme-ultraviolet frequency comb enabling frequency metrology with highly charged ions
XI. Numismatics and metrology
Children and Ultraviolet Radiation
Dreams and mirrors : = Träume und Spiegel
Industrial metrology : surfaces and roundness
Multimethod metrology of multilayer mirrors using EUV and X-Ray radiation
Radiation stability of EUV multilayer mirrors
Diffraction-based metrology in the extreme ultraviolet
Multilayer Mirrors for Attosecond Pulse Shaping between 30 and 200 eV
Multilayer mirrors for attosecond pulse shaping between 30 and 200 eV
Development of ion beam sputtering for multilayer dispersive mirrors
Multilayer mirrors for attosecond pulses in the water window spectral range
An extreme-ultraviolet frequency comb enabling frequency metrology with highly charged ions
XI. Numismatics and metrology
Children and Ultraviolet Radiation
Dreams and mirrors : = Träume und Spiegel