Effect of Ultra‐Thin AlGaN Regrown Layer on the Electrical Properties of ZrO 2/AlGaN/GaN Structures

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Effect of Ultra‐Thin AlGaN Regrown Layer on the Electrical Properties of ZrO 2/AlGaN/GaN Structures ; day:01 ; month:04 ; year:2024 ; extent:6
Physica status solidi / A. A, Applications and materials science ; (01.04.2024) (gesamt 6)

Creator
Nezu, Toi
Maeda, Shogo
Baratov, Ali
Terai, Suguru
Sekiyama, Kishi
Nagase, Itsuki
Kuzuhara, Masaaki
Yamamoto, Akio
Asubar, Joel T.

DOI
10.1002/pssa.202400073
URN
urn:nbn:de:101:1-2024040214571377026651
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 11:01 AM CEST

Data provider

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Associated

  • Nezu, Toi
  • Maeda, Shogo
  • Baratov, Ali
  • Terai, Suguru
  • Sekiyama, Kishi
  • Nagase, Itsuki
  • Kuzuhara, Masaaki
  • Yamamoto, Akio
  • Asubar, Joel T.

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