Effect of Ultra‐Thin AlGaN Regrown Layer on the Electrical Properties of ZrO 2/AlGaN/GaN Structures
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Effect of Ultra‐Thin AlGaN Regrown Layer on the Electrical Properties of ZrO 2/AlGaN/GaN Structures ; day:01 ; month:04 ; year:2024 ; extent:6
Physica status solidi / A. A, Applications and materials science ; (01.04.2024) (gesamt 6)
- Creator
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Nezu, Toi
Maeda, Shogo
Baratov, Ali
Terai, Suguru
Sekiyama, Kishi
Nagase, Itsuki
Kuzuhara, Masaaki
Yamamoto, Akio
Asubar, Joel T.
- DOI
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10.1002/pssa.202400073
- URN
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urn:nbn:de:101:1-2024040214571377026651
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 11:01 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Nezu, Toi
- Maeda, Shogo
- Baratov, Ali
- Terai, Suguru
- Sekiyama, Kishi
- Nagase, Itsuki
- Kuzuhara, Masaaki
- Yamamoto, Akio
- Asubar, Joel T.