Nanofabrication and Demonstration of a Direct‐Write Microevaporator

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Direct‐write vapor deposition is a new technique that would enable one‐step 3D maskless nanofabrication on a variety of substrates. A novel silicon chip‐based microevaporator is developed that allows evaporant to exit through 2000–300 nm nozzles while held at distances comparable to the nozzle diameter from the substrate by a three‐axis nanopositioning stage in vacuum. This results in a localized deposition on the substrate, which may be scanned relative to the substrate to produce direct‐write patterns. The performance of the microevaporator is tested by creating localized depositions of various materials and the line‐writing potential is demonstrated. The relationship between linewidth and source‐to‐substrate distance is investigated by the application of Knudsen's cosine law and Monte‐Carlo simulations, and then utilized to approximate the source‐to‐substrate distance from performed depositions.

Standort
Deutsche Nationalbibliothek Frankfurt am Main
Umfang
Online-Ressource
Sprache
Englisch

Erschienen in
Nanofabrication and Demonstration of a Direct‐Write Microevaporator ; day:22 ; month:12 ; year:2023 ; extent:13
Small science ; (22.12.2023) (gesamt 13)

Urheber
Doi, Xella
Nittala, Pavani Vamsi Krishna
Fu, Brian
Latt, Kyaw Zin
Mishra, Suryakant
Silverman, Luke
Woodard, Linus
Divan, Ralu
Guha, Supratik

DOI
10.1002/smsc.202300121
URN
urn:nbn:de:101:1-2023122314211175844873
Rechteinformation
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Letzte Aktualisierung
15.08.2025, 07:38 MESZ

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Beteiligte

  • Doi, Xella
  • Nittala, Pavani Vamsi Krishna
  • Fu, Brian
  • Latt, Kyaw Zin
  • Mishra, Suryakant
  • Silverman, Luke
  • Woodard, Linus
  • Divan, Ralu
  • Guha, Supratik

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