DC sputter deposited TiO2 layers on FTO: towards a maximum photoelectrochemical response of photoanodes
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1573-4803
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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DC sputter deposited TiO2 layers on FTO: towards a maximum photoelectrochemical response of photoanodes ; volume:57 ; number:27 ; day:2 ; month:7 ; year:2022 ; pages:12960-12970 ; date:7.2022
Journal of materials science ; 57, Heft 27 (2.7.2022), 12960-12970, 7.2022
- Creator
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Kim, Hyesung
Wang, Yue
Denisov, Nikita
Wu, Zhenni
Kment, Štěpán
Schmuki, Patrik
- Contributor
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SpringerLink (Online service)
- DOI
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10.1007/s10853-022-07420-4
- URN
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urn:nbn:de:101:1-2022091622435058128960
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
15.08.2025, 7:26 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Kim, Hyesung
- Wang, Yue
- Denisov, Nikita
- Wu, Zhenni
- Kment, Štěpán
- Schmuki, Patrik
- SpringerLink (Online service)
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