DC sputter deposited TiO2 layers on FTO: towards a maximum photoelectrochemical response of photoanodes
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1573-4803
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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DC sputter deposited TiO2 layers on FTO: towards a maximum photoelectrochemical response of photoanodes ; volume:57 ; number:27 ; day:2 ; month:7 ; year:2022 ; pages:12960-12970 ; date:7.2022
Journal of materials science ; 57, Heft 27 (2.7.2022), 12960-12970, 7.2022
- Urheber
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Kim, Hyesung
Wang, Yue
Denisov, Nikita
Wu, Zhenni
Kment, Štěpán
Schmuki, Patrik
- Beteiligte Personen und Organisationen
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SpringerLink (Online service)
- DOI
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10.1007/s10853-022-07420-4
- URN
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urn:nbn:de:101:1-2022091622435058128960
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:26 MESZ
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Beteiligte
- Kim, Hyesung
- Wang, Yue
- Denisov, Nikita
- Wu, Zhenni
- Kment, Štěpán
- Schmuki, Patrik
- SpringerLink (Online service)
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