Piezoelectric Response of Polycrystalline Silicon‐Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Piezoelectric Response of Polycrystalline Silicon‐Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles ; volume:6 ; number:3 ; year:2020 ; extent:5
Advanced electronic materials ; 6, Heft 3 (2020) (gesamt 5)
- Urheber
-
Mart, Clemens
Kämpfe, Thomas
Hoffmann, Raik
Eßlinger, Sophia
Kirbach, Sven
Kühnel, Kati
Czernohorsky, Malte
Eng, Lukas M.
Weinreich, Wenke
- DOI
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10.1002/aelm.201901015
- URN
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urn:nbn:de:101:1-2022062310543569681202
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:26 MESZ
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Beteiligte
- Mart, Clemens
- Kämpfe, Thomas
- Hoffmann, Raik
- Eßlinger, Sophia
- Kirbach, Sven
- Kühnel, Kati
- Czernohorsky, Malte
- Eng, Lukas M.
- Weinreich, Wenke
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