A High-Performance Rectangular Gate U Channel FETs with Only 2-nm Distance between Source and Drain Contacts

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1556-276X
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
A High-Performance Rectangular Gate U Channel FETs with Only 2-nm Distance between Source and Drain Contacts ; volume:14 ; number:1 ; day:4 ; month:2 ; year:2019 ; pages:1-7 ; date:12.2019
Nanoscale research letters ; 14, Heft 1 (4.2.2019), 1-7, 12.2019

Classification
Elektrotechnik, Elektronik

Creator
Liu, Xi
Xia, Zhengliang
Jin, Xiaoshi
Lee, Jong-Ho
Contributor
SpringerLink (Online service)

DOI
10.1186/s11671-019-2879-0
URN
urn:nbn:de:101:1-2019030922161307390279
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
22.08.2025, 12:46 PM CEST

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Associated

  • Liu, Xi
  • Xia, Zhengliang
  • Jin, Xiaoshi
  • Lee, Jong-Ho
  • SpringerLink (Online service)

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