- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: Applied Physics Letters (116:12) - Melville, NY : American Institute of Physics (AIP) - Art.-Id. 121101
- Event
-
Veröffentlichung
- (where)
-
Berlin
- (who)
-
Technische Universität Berlin
- (when)
-
2020
- Creator
-
Bergmann, Michael A.
Enslin, Johannes
Hjort, Filip
Wernicke, Tim
Kneissl, Michael
Haglund, Åsa
- DOI
-
10.14279/depositonce-10129
- Handle
-
11303/11241
- URN
-
urn:nbn:de:101:1-2020060301574373518346
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:50 PM CET
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Bergmann, Michael A.
- Enslin, Johannes
- Hjort, Filip
- Wernicke, Tim
- Kneissl, Michael
- Haglund, Åsa
- Technische Universität Berlin
Time of origin
- 2020
Other Objects (12)
MOVPE growth of (In)AlGaN-based heterostructures for thin-film LEDs and VCSELs in the UVB spectral range
Low resistance n-contact for UVC LEDs by a two-step plasma etching process
Imaging gratings with modulated blaze - realized by a combination of holography and reactive ion beam etching
Growth, etching, and stability of sputtered ZnO:Al for thin-film silicon solar cells
Growth, etching, and stability of sputtered ZnO:AI for thin-film silicon solar cells
Etching
Hochleistungs-LEDs in der Praxis : [Grundlagen, Ansteuerung, allgemeine Beleuchtung mit LEDs, LEDs im Automobil]
Realized quantiles*
Realized Copula
Realized volatility
Realized copula
Dutch Etching
MOVPE growth of (In)AlGaN-based heterostructures for thin-film LEDs and VCSELs in the UVB spectral range
Low resistance n-contact for UVC LEDs by a two-step plasma etching process
Imaging gratings with modulated blaze - realized by a combination of holography and reactive ion beam etching
Growth, etching, and stability of sputtered ZnO:Al for thin-film silicon solar cells
Growth, etching, and stability of sputtered ZnO:AI for thin-film silicon solar cells
Etching
Hochleistungs-LEDs in der Praxis : [Grundlagen, Ansteuerung, allgemeine Beleuchtung mit LEDs, LEDs im Automobil]
Realized quantiles*
Realized Copula
Realized volatility
Realized copula
Dutch Etching
MOVPE growth of (In)AlGaN-based heterostructures for thin-film LEDs and VCSELs in the UVB spectral range
Low resistance n-contact for UVC LEDs by a two-step plasma etching process
Imaging gratings with modulated blaze - realized by a combination of holography and reactive ion beam etching
Growth, etching, and stability of sputtered ZnO:Al for thin-film silicon solar cells
Growth, etching, and stability of sputtered ZnO:AI for thin-film silicon solar cells
Etching
Hochleistungs-LEDs in der Praxis : [Grundlagen, Ansteuerung, allgemeine Beleuchtung mit LEDs, LEDs im Automobil]
Realized quantiles*
Realized Copula
Realized volatility
Realized copula