Formation Mechanism of Precursor Films at High Temperatures: A Review

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
2192-8258
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Formation Mechanism of Precursor Films at High Temperatures: A Review ; volume:35 ; number:1 ; day:5 ; month:3 ; year:2022 ; pages:1-11 ; date:12.2022
Chinese journal of mechanical engineering ; 35, Heft 1 (5.3.2022), 1-11, 12.2022

Classification
Physik

Creator
Lin, Qiaoli
Liu, Lu
Zhu, Wenqi
Contributor
SpringerLink (Online service)

DOI
10.1186/s10033-022-00686-4
URN
urn:nbn:de:101:1-2022060123375597403192
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:22 AM CEST

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Associated

  • Lin, Qiaoli
  • Liu, Lu
  • Zhu, Wenqi
  • SpringerLink (Online service)

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