Photosensitive cellulosic materials based on a covalently grafted phenosafranin-modified silsesquioxane analog for bactericidal applications
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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1 Online-Ressource.
- Sprache
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Englisch
- Erschienen in
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Photosensitive cellulosic materials based on a covalently grafted phenosafranin-modified silsesquioxane analog for bactericidal applications ; volume:30 ; number:18 ; day:13 ; month:11 ; year:2023 ; pages:11681-11700 ; date:12.2023
Cellulose ; 30, Heft 18 (13.11.2023), 11681-11700, 12.2023
- Urheber
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Rozga-Wijas, Krystyna
Ganicz, Tomasz
Miksa, Beata
Makowski, Tomasz
Knopik, Lucja
Turecka, Katarzyna
Waleron, Krzysztof
- Beteiligte Personen und Organisationen
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SpringerLink (Online service)
- DOI
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10.1007/s10570-023-05578-x
- URN
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urn:nbn:de:101:1-2024022110180519433051
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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14.08.2025, 10:50 MESZ
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Beteiligte
- Rozga-Wijas, Krystyna
- Ganicz, Tomasz
- Miksa, Beata
- Makowski, Tomasz
- Knopik, Lucja
- Turecka, Katarzyna
- Waleron, Krzysztof
- SpringerLink (Online service)
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