Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Interfacial Contact is Required for Metal‐Assisted Plasma Etching of Silicon ; volume:5 ; number:24 ; year:2018 ; extent:8
Advanced materials interfaces ; 5, Heft 24 (2018) (gesamt 8)

Creator
Sun, Julia B.
Almquist, Benjamin D.

DOI
10.1002/admi.201800836
URN
urn:nbn:de:101:1-2022090306061723067164
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:36 AM CEST

Data provider

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Associated

  • Sun, Julia B.
  • Almquist, Benjamin D.

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