Fabrication and electrochemical characterization of ruthenium nanoelectrodes

Abstract: The Fraunhofer IMS has recently developed a technique for producing nanoelectrodes that are generated by atomic layer deposition (ALD) in a via deep reactive ion etching (DRIE) structured sacrificial layer. This method enables the fabrication of CMOS- and biocompatible nanoelectrodes with suitable ALD-materials. Improvements of the established fabrication processes and the electrochemical characterization of such electrodes are presented. In the frame of the Fraunhofer-Max-Planckcooperation project ZellMOS different types of nanoelectrodes are studied. Their diameter is in the range of 200 nm and thereby sufficiently small to be taken up by living cells. In addition, the electrodes are mechanically enforced by an oxide layer at the nanoelectrodes’ bottom.

Angaben zum Objekt

• Standort: Deutsche Nationalbibliothek Frankfurt am Main
• Umfang: Online-Ressource
• Sprache: Englisch

Verweise und Beziehungen

• Erschienen in: Fabrication and electrochemical characterization of ruthenium nanoelectrodes ; volume:3 ; number:2 ; year:2017 ; pages:393-396 ; extent:4 ; Current directions in biomedical engineering ; 3, Heft 2 (2017), 393-396 (gesamt 4)

Beteiligte, Orts- und Zeitangaben

• Urheber: Allani, Sonja ; Jupe, Andreas ; Figge, Martin ; Goehlich, Andreas ; Vogt, Holger

Weitere Informationen

• DOI: 10.1515/cdbme-2017-0082
• URN: urn:nbn:de:101:1-2023030713170444057729
• Rechteinformation: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
• Letzte Aktualisierung: 10.02.4203, 09:46 MEZ