Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth ; volume:9 ; number:1 ; day:11 ; month:7 ; year:2014 ; pages:1-9 ; date:12.2014
Nanoscale research letters ; 9, Heft 1 (11.7.2014), 1-9, 12.2014
- Urheber
-
Karim, Marwa
Martini, Roberto
Radhakrishnan, Hariharsudan Sivaramakrishnan
van Nieuwenhuysen, Kris
Depauw, Valerie
Ramadan, Wedgan
Gordon, Ivan
Poortmans, Jef
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
-
10.1186/1556-276X-9-348
- URN
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urn:nbn:de:101:1-2019080302565368142596
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:37 MESZ
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Beteiligte
- Karim, Marwa
- Martini, Roberto
- Radhakrishnan, Hariharsudan Sivaramakrishnan
- van Nieuwenhuysen, Kris
- Depauw, Valerie
- Ramadan, Wedgan
- Gordon, Ivan
- Poortmans, Jef
- SpringerLink (Online service)
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