Optimizing the plasma oxidation of aluminum gate electrodes for ultrathin gate oxides in organic transistors

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Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
In: Scientific reports 11 (2021), No. 6382

Event
Veröffentlichung
(where)
Stuttgart
(who)
Universitätsbibliothek der Universität Stuttgart
(when)
2021
Creator
Geiger, Michael
Hagel, Marion
Reindl, Thomas
Weis, Jürgen
Weitz, R. Thomas
Solodenko, Helena
Schmitz, Guido
Zschieschang, Ute
Klauk, Hagen
Acharya, Rachana

DOI
10.18419/opus-13057
URN
urn:nbn:de:bsz:93-opus-ds-130763
Rights
Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
25.03.2025, 1:53 PM CET

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Associated

Time of origin

  • 2021

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