Running-in process of Si-SiO x /SiO2 pair at nanoscale—Sharp drops in friction and wear rate during initial cycles
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2223-7704
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Running-in process of Si-SiO x /SiO2 pair at nanoscale—Sharp drops in friction and wear rate during initial cycles ; volume:1 ; number:1 ; day:26 ; month:3 ; year:2013 ; pages:81-91 ; date:3.2013
Friction ; 1, Heft 1 (26.3.2013), 81-91, 3.2013
- Creator
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Chen, Lei
- Contributor
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Kim, Seong H.
Wang, Xiaodong
Qian, Linmao
SpringerLink (Online service)
- DOI
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10.1007/s40544-013-0007-1
- URN
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urn:nbn:de:1111-2016052318464
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 11:03 AM CEST
Data provider
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Associated
- Chen, Lei
- Kim, Seong H.
- Wang, Xiaodong
- Qian, Linmao
- SpringerLink (Online service)
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