An Unusual Tri‐coordinate Co (II) Silylamide with Potential for Chemical Vapor Deposition Processes
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
An Unusual Tri‐coordinate Co (II) Silylamide with Potential for Chemical Vapor Deposition Processes ; day:05 ; month:10 ; year:2022 ; extent:1
Zeitschrift für anorganische und allgemeine Chemie ; (05.10.2022) (gesamt 1)
- Urheber
- DOI
-
10.1002/zaac.202200249
- URN
-
urn:nbn:de:101:1-2022100615070583154930
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:21 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Zanders, David
- Masuda, Jason
- Lowe, Bethany
- Curtis, Sharon
- Devi, Anjana
- Barry, Seán Thomas
Ähnliche Objekte (12)
An unusual tri-coordinate Co(II) silylamide with potential for chemical vapor deposition processes
Chemical vapor deposition : CVD
Modeling for Chemical Vapor Deposition
Modeling for Chemical Vapor Deposition
Simulation of a Chemical Vapor Deposition
Vapor wall deposition in Teflon chambers
Chemical vapor deposition : modeling, simulation and optimization
Modeling and Simulation for Physical Vapor Deposition
Quasistatic Equilibrium Chemical Vapor Deposition of Graphene
Aspects of thin film deposition on granulates by physical vapor deposition
Synthesis of Thin Films by Chemical Vapor Deposition : Synthesis of thin MoS films with Chemical Vapor Deposition
Numerical simulation of plasma spray-physical vapor deposition
An unusual tri-coordinate Co(II) silylamide with potential for chemical vapor deposition processes
Chemical vapor deposition : CVD
Modeling for Chemical Vapor Deposition
Modeling for Chemical Vapor Deposition
Simulation of a Chemical Vapor Deposition
Vapor wall deposition in Teflon chambers
Chemical vapor deposition : modeling, simulation and optimization
Modeling and Simulation for Physical Vapor Deposition
Quasistatic Equilibrium Chemical Vapor Deposition of Graphene
Aspects of thin film deposition on granulates by physical vapor deposition
Synthesis of Thin Films by Chemical Vapor Deposition : Synthesis of thin MoS films with Chemical Vapor Deposition
Numerical simulation of plasma spray-physical vapor deposition
An unusual tri-coordinate Co(II) silylamide with potential for chemical vapor deposition processes
Chemical vapor deposition : CVD
Modeling for Chemical Vapor Deposition
Modeling for Chemical Vapor Deposition
Simulation of a Chemical Vapor Deposition
Vapor wall deposition in Teflon chambers
Chemical vapor deposition : modeling, simulation and optimization
Modeling and Simulation for Physical Vapor Deposition
Quasistatic Equilibrium Chemical Vapor Deposition of Graphene
Aspects of thin film deposition on granulates by physical vapor deposition
Synthesis of Thin Films by Chemical Vapor Deposition : Synthesis of thin MoS films with Chemical Vapor Deposition