An unusual tri-coordinate Co(II) silylamide with potential for chemical vapor deposition processes
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: Zeitschrift für anorganische und allgemeine Chemie, 648, 24, Artikel e202200249, S. e202200249-1-e202200249-6
- Event
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Veröffentlichung
- (where)
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Bochum
- (who)
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Ruhr-Universität Bochum
- (when)
-
2022
- Creator
- URN
-
urn:nbn:de:hbz:294-121538
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:29 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Zanders, David
- Masuda, Jason
- Lowe, Bethany
- Curtis, Sharon
- Devi, Anjana
- Barry, Seán Thomas
- Ruhr-Universität Bochum
Time of origin
- 2022
Other Objects (12)
An Unusual Tri‐coordinate Co (II) Silylamide with Potential for Chemical Vapor Deposition Processes
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Chemical vapor deposition : modeling, simulation and optimization
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An Unusual Tri‐coordinate Co (II) Silylamide with Potential for Chemical Vapor Deposition Processes
Chemical vapor deposition : CVD
Modeling for Chemical Vapor Deposition
Modeling for Chemical Vapor Deposition
Simulation of a Chemical Vapor Deposition
Vapor wall deposition in Teflon chambers
Chemical vapor deposition : modeling, simulation and optimization
Modeling and Simulation for Physical Vapor Deposition
Quasistatic Equilibrium Chemical Vapor Deposition of Graphene
Aspects of thin film deposition on granulates by physical vapor deposition
Synthesis of Thin Films by Chemical Vapor Deposition : Synthesis of thin MoS films with Chemical Vapor Deposition
Numerical simulation of plasma spray-physical vapor deposition
An Unusual Tri‐coordinate Co (II) Silylamide with Potential for Chemical Vapor Deposition Processes
Chemical vapor deposition : CVD
Modeling for Chemical Vapor Deposition
Modeling for Chemical Vapor Deposition
Simulation of a Chemical Vapor Deposition
Vapor wall deposition in Teflon chambers
Chemical vapor deposition : modeling, simulation and optimization
Modeling and Simulation for Physical Vapor Deposition
Quasistatic Equilibrium Chemical Vapor Deposition of Graphene
Aspects of thin film deposition on granulates by physical vapor deposition
Synthesis of Thin Films by Chemical Vapor Deposition : Synthesis of thin MoS films with Chemical Vapor Deposition