InSe Schottky Diodes Based on Van Der Waals Contacts

Abstract: 2D semiconductors are excellent candidates for next‐generation electronics and optoelectronics thanks to their electrical properties and strong light‐matter interaction. To fabricate devices with optimal electrical properties, it is crucial to have both high‐quality semiconducting crystals and ideal contacts at metal‐semiconductor interfaces. Thanks to the mechanical exfoliation of van der Waals crystals, atomically thin high‐quality single‐crystals can easily be obtained in a laboratory. However, conventional metal deposition techniques can introduce chemical disorder and metal‐induced mid‐gap states that induce Fermi level pinning and can degrade the metal‐semiconductor interfaces, resulting in poorly performing devices. In this article, the electrical contact characteristics of Au–InSe and graphite–InSe van der Waals contacts, obtained by stacking mechanically exfoliated InSe flakes onto pre‐patterned Au or graphite electrodes without the need for lithography or metal deposition is explored. The high quality of the metal‐semiconductor interfaces obtained by van der Waals contact allows to fabricate high‐quality Schottky diodes based on the Au–InSe Schottky barrier. The experimental observation indicates that the contact barrier at the graphite–InSe interface is negligible due to the similar electron affinity of InSe and graphite, while the Au–InSe interfaces are dominated by a large Schottky barrier.

Standort
Deutsche Nationalbibliothek Frankfurt am Main
Umfang
Online-Ressource
Sprache
Englisch

Erschienen in
InSe Schottky Diodes Based on Van Der Waals Contacts ; volume:30 ; number:24 ; year:2020 ; extent:10
Advanced functional materials ; 30, Heft 24 (2020) (gesamt 10)

Urheber
Zhao, Qinghua
Jie, Wanqi
Wang, Tao
Castellanos‐Gomez, Andres
Frisenda, Riccardo

DOI
10.1002/adfm.202001307
URN
urn:nbn:de:101:1-2022061413153150107490
Rechteinformation
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Letzte Aktualisierung
15.08.2025, 07:28 MESZ

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Beteiligte

  • Zhao, Qinghua
  • Jie, Wanqi
  • Wang, Tao
  • Castellanos‐Gomez, Andres
  • Frisenda, Riccardo

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