The Optimization of Spacer Engineering for Capacitor-Less DRAM Based on the Dual-Gate Tunneling Transistor

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1556-276X
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
The Optimization of Spacer Engineering for Capacitor-Less DRAM Based on the Dual-Gate Tunneling Transistor ; volume:13 ; number:1 ; day:5 ; month:3 ; year:2018 ; pages:1-9 ; date:12.2018
Nanoscale research letters ; 13, Heft 1 (5.3.2018), 1-9, 12.2018

Classification
Ingenieurwissenschaften und Maschinenbau

Creator
Li, Wei
Contributor
Liu, Hongxia
Wang, Shulong
Chen, Shupeng
Wang, Qianqiong
SpringerLink (Online service)

DOI
10.1186/s11671-018-2483-8
URN
urn:nbn:de:1111-201805112527
Rights
Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:55 AM CEST

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Associated

  • Li, Wei
  • Liu, Hongxia
  • Wang, Shulong
  • Chen, Shupeng
  • Wang, Qianqiong
  • SpringerLink (Online service)

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