Molecular dynamics modeling framework for overcoming nanoshape retention limits of imprint lithography

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Location: Deutsche Nationalbibliothek Frankfurt am Main

ISSN: 2055-7434

Extent: Online-Ressource

Language: Englisch

Notes: online resource.

Bibliographic citation: Molecular dynamics modeling framework for overcoming nanoshape retention limits of imprint lithography ; volume:4 ; number:1 ; day:23 ; month:4 ; year:2018 ; pages:1-10 ; date:12.2018
Microsystems & nanoengineering ; 4, Heft 1 (23.4.2018), 1-10, 12.2018

Classification: Physik

Creator: Cherala, Anshuman

Contributor: Sreenivasan, S. V.
SpringerLink (Online service)

DOI: 10.1038/s41378-018-0007-4

URN: urn:nbn:de:101:1-2018082723084123776426

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 15.08.2025, 7:38 AM CEST

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Cherala, Anshuman
Sreenivasan, S. V.
SpringerLink (Online service)

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Molecular dynamics modeling framework for overcoming nanoshape retention limits of imprint lithography

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