METHODOLOGY FOR DETERMINING OPTIMAL EXPOSURE PARAMETERS OF A HYPERSPECTRAL SCANNING SENSOR
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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METHODOLOGY FOR DETERMINING OPTIMAL EXPOSURE PARAMETERS OF A HYPERSPECTRAL SCANNING SENSOR ; volume:XLI-B1 ; year:2016 ; pages:1065-1069
The International Archives of the Photogrammetry, Remote Sensing and Spatial Information Sciences ; XLI-B1 (2016), 1065-1069
- Urheber
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Walczykowski, P.
Siok, K.
Jenerowicz, A.
- DOI
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10.5194/isprs-archives-XLI-B1-1065-2016
- URN
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urn:nbn:de:101:1-201711095789
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:28 MESZ
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Beteiligte
- Walczykowski, P.
- Siok, K.
- Jenerowicz, A.
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