Electric-field-induced crystallization of Hf0.5Zr0.5O2 thin film based on phase-field modeling
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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1 Online-Ressource.
- Language
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Englisch
- Bibliographic citation
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Electric-field-induced crystallization of Hf0.5Zr0.5O2 thin film based on phase-field modeling ; volume:9 ; number:1 ; day:23 ; month:5 ; year:2024 ; pages:1-6 ; date:12.2024
npj quantum materials ; 9, Heft 1 (23.5.2024), 1-6, 12.2024
- Creator
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Liu, Zhaobo
Shi, Xiaoming
Wang, Jing
Huang, Houbing
- Contributor
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SpringerLink (Online service)
- DOI
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10.1038/s41535-024-00652-4
- URN
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urn:nbn:de:101:1-2408020929257.660074089571
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 10:56 AM CEST
Data provider
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Liu, Zhaobo
- Shi, Xiaoming
- Wang, Jing
- Huang, Houbing
- SpringerLink (Online service)
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