Polyhedral oligomeric silsesquioxane (POSS)-modified phenolic resin: Synthesis and anti-oxidation properties
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Polyhedral oligomeric silsesquioxane (POSS)-modified phenolic resin: Synthesis and anti-oxidation properties ; volume:21 ; number:1 ; year:2021 ; pages:316-326 ; extent:11
e-Polymers ; 21, Heft 1 (2021), 316-326 (gesamt 11)
- Urheber
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Wang, Bing
Shi, Minxian
Ding, Jie
Huang, Zhixiong
- DOI
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10.1515/epoly-2021-0031
- URN
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urn:nbn:de:101:1-2412151649390.162225286779
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:36 MESZ
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Beteiligte
- Wang, Bing
- Shi, Minxian
- Ding, Jie
- Huang, Zhixiong
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