Inverse design of high-NA metalens for maskless lithography
Abstract: We demonstrate an axisymmetric inverse-designed metalens to improve the performance of zone-plate-array lithography (ZPAL), one of the maskless lithography approaches, that offer a new paradigm for nanoscale research and industry. First, we derive a computational upper bound for a unit-cell-based axisymmetric metalens. Then, we demonstrate a fabrication-compatible inverse-designed metalens with 85.50% transmission normalized focusing efficiency at 0.6 numerical aperture at 405 nm wavelength; a higher efficiency than a theoretical gradient index lens design (79.98%). We also demonstrate experimental validation for our axisymmetric inverse-designed metalens via electron beam lithography. Metalens-based maskless lithography may open a new way of achieving low-cost, large-area nanofabrication.
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Inverse design of high-NA metalens for maskless lithography ; volume:12 ; number:13 ; year:2023 ; pages:2371-2381 ; extent:11
Nanophotonics ; 12, Heft 13 (2023), 2371-2381 (gesamt 11)
- Creator
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Chung, Haejun
Zhang, Feng
Li, Hao
Miller, Owen D.
Smith, Henry I.
- DOI
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10.1515/nanoph-2022-0761
- URN
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urn:nbn:de:101:1-2023062714055959782706
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 11:04 AM CEST
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Associated
- Chung, Haejun
- Zhang, Feng
- Li, Hao
- Miller, Owen D.
- Smith, Henry I.
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