Self‐Assembly of Well‐Separated AlN Nanowires Directly on Sputtered Metallic TiN Films

Herein, the self‐assembled formation of AlN nanowires (NWs) by molecular beam epitaxy on sputtered TiN films on sapphire is demonstrated. This choice of substrate allows growth at an exceptionally high temperature of 1180 °C. In contrast to previous reports, the NWs are well separated and do not suffer from pronounced coalescence. This achievement is explained by sufficient Al adatom diffusion on the substrate and the NW sidewalls. The high crystalline quality of the NWs is evidenced by the observation of near‐band‐edge emission in the cathodoluminescence spectrum. The key factor for the low NW coalescence is the TiN film, which spectroscopic ellipsometry and Raman spectroscopy indicate to be stoichiometric. Its metallic nature will be beneficial for optoelectronic devices using these NWs as the basis for (Al,Ga) N/AlN heterostructures emitting in the deep ultraviolet spectral range.

Standort
Deutsche Nationalbibliothek Frankfurt am Main
Umfang
Online-Ressource
Sprache
Englisch

Erschienen in
Self‐Assembly of Well‐Separated AlN Nanowires Directly on Sputtered Metallic TiN Films ; volume:14 ; number:3 ; year:2020 ; extent:5
Physica status solidi / Rapid research letters. Rapid research letters ; 14, Heft 3 (2020) (gesamt 5)

Urheber
Azadmand, Mani
Auzelle, Thomas
Lähnemann, Jonas
Gao, Guanhui
Nicolai, Lars
Ramsteiner, Manfred
Trampert, Achim
Sanguinetti, Stefano
Brandt, Oliver
Geelhaar, Lutz

DOI
10.1002/pssr.201900615
URN
urn:nbn:de:101:1-2022062611194512703921
Rechteinformation
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Letzte Aktualisierung
15.08.2025, 07:37 MESZ

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Beteiligte

  • Azadmand, Mani
  • Auzelle, Thomas
  • Lähnemann, Jonas
  • Gao, Guanhui
  • Nicolai, Lars
  • Ramsteiner, Manfred
  • Trampert, Achim
  • Sanguinetti, Stefano
  • Brandt, Oliver
  • Geelhaar, Lutz

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