Simulation of the optical coating deposition
Abstract: A brief review of the mathematical methods of thin-film growth simulation and results of their applications is presented. Both full-atomistic and multi-scale approaches that were used in the studies of thin-film deposition are considered. The results of the structural parameter simulation including density profiles, roughness, porosity, point defect concentration, and others are discussed. The application of the quantum level methods to the simulation of the thin-film electronic and optical properties is considered. Special attention is paid to the simulation of the silicon dioxide thin films.
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Simulation of the optical coating deposition ; volume:7 ; number:1-2 ; year:2018 ; pages:13-22 ; extent:10
Advanced Optical Technologies ; 7, Heft 1-2 (2018), 13-22 (gesamt 10)
- Urheber
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Grigoriev, Fedor
Sulimov, Vladimir
Tikhonravov, Alexander
- DOI
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10.1515/aot-2017-0079
- URN
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urn:nbn:de:101:1-2405071638155.638609290251
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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2025-08-14T10:49:04+0200
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Beteiligte
- Grigoriev, Fedor
- Sulimov, Vladimir
- Tikhonravov, Alexander
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