Direct Metal‐Free Chemical Vapor Deposition of Graphene Films on Insulating Substrates for Micro‐Supercapacitors with High Volumetric Capacitance
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Direct Metal‐Free Chemical Vapor Deposition of Graphene Films on Insulating Substrates for Micro‐Supercapacitors with High Volumetric Capacitance ; volume:2 ; number:11 ; year:2019 ; pages:929-933 ; extent:5
Batteries & supercaps ; 2, Heft 11 (2019), 929-933 (gesamt 5)
- Urheber
- DOI
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10.1002/batt.201900087
- URN
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urn:nbn:de:101:1-2022070711542571715413
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:34 MESZ
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Beteiligte
- Wuttke, Michael
- Liu, Zhaoyang
- Lu, Hao
- Narita, Akimitsu
- Müllen, Klaus
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